This course is intended for students, engineers, technicians, and others interested in plasma-assisted deposition of thin film and functional coatings. A good portion of the course is dedicated to introduce and review the basics of low-temperature plasmas and discharges to produce them. While gas plasmas are often used, emphasis is put on discharges that lead to ionization of plasma with condensable species: metal or metal-containing plasmas, leading to coatings from the plasma phase. In contrast to many other courses, the role of plasmas and sheaths will be clearly distinguished and explained. This distinction is will be appreciated when examples of processes with plasmas are given, including but not limited to plasmas made by ion plating, filtered cathodic arcs and by high power impulse magnetron sputtering (HiPIMS). After over a decade of research, HiPIMS has become an industrially used extension of sputtering technology. With sputtered metals ionized, the texture of coatings can be tuned by energetic condensation even when substrates are kept near room temperature. Recent developments of HiPIMS will be discussed, including reactive HiPIMS and so-called “hybrid technology” where one of the components is HiPIMS.