Ellipsometry is a powerful optical characterization technique applicable to all material types including semiconductors, dielectrics, metals and organics possessing various structures, such as multilayers and nanostructured thin films. With recent advances in optical instrumentation, many systems now rely on the high accuracy of spectroscopic ellipsometry (SE) for the measurement of film thickness and optical properties from the VUV to the IR. Shorter wavelengths increase sensitivity to ultra-thin films, while IR data allow identification and quantification of chemical bonds, as well as accurate n and k determination at the Mid- and Far-IR wavelengths.
This three-hour workshop will cover the following key points:
- An overview of the fundamentals of SE (~1 hour);
- Standard to advanced applications of SE by a case studies approach including (~1 h 15 min):
- Thin films and bulk materials o Mueller matrix ellipsometry and anisotropic materials
- Porosimetry measurements
- Other applications (temperature measurements, chemical cell, etc.)
- Q&A session: Live questions as well as specific questions sent by the participants at least 1 week prior to the workshop will be addressed (~45 min).
Please contact Bill Baloukas at firstname.lastname@example.org for additional information and questions.