Live Q&A Moderated Discussion for all presenters from Session 4: Advanced Plasma-based Processes for Functional Coatings II includes:

• The quest for understanding and optimizing plasma-based deposition
• Monitoring tantalum nitride thin films structure by reactive HiPIMS: From microstructure to properties
•  Effect of plasma power and deposition pressure on the structural and optoelectronic properties of WS2 Films
• Characterization of silicon nitride thin films deposited by PECVD using microstructures